Motic PSM 1000 Series PSM1000E
Sample configuration including:
|PSM-1000E Standard System
|Trinocular tilting head [Optical split - 50:50 / 0:100]
|Adjustable widefield high eyepoint 10X/F.N.24
|3-lens changeover turret [1XUV, 1XIR, 2XVIS]
|Focusing Block - 20kgs rated
|Adjustable forward facing nosepiece [dovetail mount]
|One fixed and three adjustable positions
|Laser capabilities [355nm - 1064nm]
|Laser safety kit [shims and laser safety pin]
A conveniently laid out laser-ready system, ideal for the semiconductor & flat panel display industries.
Constructed around specially coated optics and geared for inspection and laser work [355nm - 1064nm] in one system, the PSM-1000 employs a series of features to facilitate both functions. The PSM-1000 can be quickly converted from optical inspection to laser work by utilizing the 3-lens changeover turret and the beam splitter. The 3-lens changeover turret permits the user to select the spectrum to operate in or simply to magnify the image 2X [2000X maximum magnification with a 100X objective], whereas the beam splitter removes the optical prism to achieve the maximum transmission of the laser pulse. Current transmission efficiency tests put the PSM-1000 at 82% in the 1064nm spectrum.
Precise movements are crucial either when using a laser or inspection wafers or flat panels at high magnifications. Even with a resolution of 1 mm, the PSM-1000's focusing block can handle mounted weight up to 45lbs. The total stroke for the focusing block is 50mm with the option of being reversed for greater use of space.
The PSM-1000 is equipped standard with an adjustable forward-facing nosepiece. The mechanism of the nosepiece allows you to parcenter the objective by inserting two parcentering keys above the objective for convenience and speed. Gone are the days of hunting and pecking with a hexagon key!
The Motic PSM-1000 is a modular microscope system that can be used for applications in the semiconductor industry as well as for laser inspections and repairs. Or simply for applications where high quality optics, precision mechanics and Long Working Distances are crucial and have to be combined with an upright image.
The Motic PSM-1000 incorporates a 3-lens change-over turret that allows the user to easily switch from visual inspection to laser work. With the following optical lenses 1X UV/, 1X IR/VIS and 2X Bright field the spectrum from 355nm to 1064nm is covered. All optical components have a special coating for maximum transmission.
Motic offers a wide range of Apochromatic objectives covering magnifications from 2X to 100X. There are 3 different classes available:
•Apochromatic Extra Long Working Distance (ELWD) objectives
•Apochromatic Extra Long Working Distance (ELWD) objectives with parfocality adjustment; eliminates the need to re-focus when changing magnification.
•Apochromatic Ultra Long Working Distance (ULWD) objectives 50X and 100X.
•Laser ready microscope system
•Wavelength coverage from 355-1064nm
•Upright image for easy manipulation work
•Apochromatic ELWD, ELWD with parfocality adjustment or ULWD objectives
•Built-in camera port for documentation
•Stand with compact footprint and mechanical stage available
|Siedentopf type, adjustment range: 55mm-75 mm
|Optical pass ratio
|Switchable [eyepiece/laser = 100/0 or 0/100]; Simultaneous observation [50:50]
|Observation angle adjustment
|3° to 30°
|Tube lens [correction]
|1x [ultraviolet and infrared] and 2x [visible]
|Pull out beam splitter for laser work
|1064/532/355nm NWR laser
|20X – 2000X
|Witd coaxial coarse and fine focusing wheels [right/left] [50mm travel range, 0.1mm/rev. for fine adjustment, 4mm/rev. for coarse adjustment]
|Loading weight on optical tube
|Light source [optional]
|150W cold light source, light guide lengtd 2m.
|Parcenterable, outward, rotary type for bright field lens [witd 4 mounts], detachable
|ELWD Plan Apo
|2x, 5x, 10x, 20x, 50x
|ULWD Plan Apo
|ELWD Plan Apo [Parfocality Adjustable]
|2x, 5x, 10x, 20x, 50x
|ULWD Plan Apo [Parfocality Adjustable]
|Mass [main unit/light source]